Photolithography patent

Author: sxcb

August undefined, 2024

WebOct 17, 2024 · The present application is related to and commonly owned U.S. patent application Ser. No. 13/103,576, filed May 9, 2011, now U.S. Pat. No. 8,632,583, which is hereby incorporated by reference in its entirety. ... Although photolithography methodologies are discussed herein as a method of forming the noncontiguous pattern of topographical ... WebNov 18, 2024 · One of the process steps commonly encountered in the fabrication of integrated circuits and other semiconductor devices is photolithography. Broadly, …

US Patent for Custom photolithography masking via precision …

WebDec 13, 2024 · Published by Statista Research Department , Dec 13, 2024. In 2024, China had the most patents in force worldwide with about 3.6 million patents in force. The United States had the second most ... WebA photolithography apparatus includes a cleaning unit which cleans a target substrate, ... This application claims priority to Korean Patent Application No. 10-2024-0095000, filed on Jul. 20, 2024, and all the benefits accruing therefrom under 35 U.S.C. § 119, the content of which in its entirety is herein incorporated by reference. ... inc. montgomery facebook

US7972761B2 - Photoresist materials and …

WebJan 9, 2024 · ASML Holdings {{snapshot:ASML}} is the world’s largest supplier of extreme ultraviolet lithography (EUV) photolithography machines, which are used to produce … WebEECS 598-002 Nanophotonics and Nanoscale Fabrication by P.C.Ku 17 Challenges in lens design Larger lens (required by better resolution) Æaberration Suitably rotating the lens in the step-and-scan system can minimize the aberration Finite linewidth of laser source Ædispersion Aspheric lens Æmore expensive Tighter spec on surface quality of lens WebSystems and methods for custom photolithography masking via a precision dispense apparatus and process are disclosed. Methods include creating a toolpath instruction for depositing opaque onto a substrate, programming a precision dispense apparatus to execute the created toolpath instruction, and causing the precision dispense tool to … inc. motorcycle training course corona

US Patent Application for PHOTOLITHOGRAPHY …

Chemistry of photolithography - Wikipedia

WebPhotolithography represents the workhorse technology for device manufacture and has traditionally used a Hg or Hg–Xe discharge lamp as the radiation source. Resist systems … WebOct 4, 2024 · Patent No. 9,773,594 Continuous flow synthetic methods are used to make single phase magnetic metal alloy nanoparticles that do not contain rare earth metals. … inc. naples flWebFeb 8, 1994 · 1. A photolithography test structure comprising: a substrate; a first curved insulating structure having a sloped sidewall deposited upon said substrate; an interconnect structure deposited upon said substrate a spaced distance from said sloped sidewall; and a pair of conductive pads deposited upon said substrate and connected at opposite ends of … inc. morgan stanley

"The root words photo, litho, and graphy all have Greek origins, with the meanings 'light', 'stone' and 'writing' respectively. As suggested by the name compounded from them, photolithography is a printing method (originally based on the use of limestone printing plates) in which light plays an essential role. In the 1820s, Nicephore Niepce invented a photographic process that used Bitumen of Judea, a natural asphalt, as the first photoresist. A thin coating of the bitumen on a sheet of m… " - Photolithography patent

Photolithography patent

1955: Photolithography Techniques Are Used to Make …

WebDec 13, 2024 · A photolithography patterning process, including depositing a photoresist material, exposing according to a desired pattern, and developing, is used to pattern the dielectric layer and the conductive layer to form a gate dielectric 1405 and a gate electrode 1407 of the gate stack 1403, as illustrated in FIG. WebPhotolithography is the standard method of printed circuit board (PCB) and microprocessor fabrication. The process uses light to make the conductive paths of a PCB layer and the …

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WebA processing line (100), comprising: a photolithography tool (120) configured to process wafers in accordance with an operating recipe; an overlay metrology tool (130) configured to measure overlay errors associated with the processing of the wafers in the photolithography tool (120); and a controller (140) configured to receive a first overlay ... WebChemistry of photolithography. A gold and aluminum sputtered solar cell manufactured from a <100> p-type silicon wafer at the Cal Poly San Luis Obispo Microfab clean room. …

WebASML’s lithography systems are central to that process. A lithography (more formally known as ‘photolithography’) system is essentially a projection system. Light is projected …

WebPatent Number: 11,424,135: Issued: 8/23/2024: Official Filing: View the Complete Patent: Application Number: 182,838/17: Government Interests: STATEMENT OF GOVERNMENT INTEREST This invention was made with Government support under Contract No. DE-NA0003525 awarded by the United States Department of Energy/National Nuclear … WebAug 8, 2024 · 2024-07-06 Priority to US17/858,105 priority Critical patent/US20240344380A1/en 2024-03-21 Application granted granted Critical ... When the photolithography process is performed using a halftone mask in the non-display region, etching is performed by copper acid and oxalic acid to define a pattern. Then, the …

WebApr 26, 2024 · Patent Number(s): 11,312,067 Application Number: Assignee: Lawrence Livermore National Security, LLC (Livermore, CA) DOE Contract Number: AC52-07NA27344 Resource Type: Patent ... Apparatus and method for generating partially coherent illumination for photolithography. Patent Sweatt, W.

WebAug 25, 2024 · Abstract: Systems and methods for custom photolithography masking via a precision dispense apparatus and process are disclosed. Methods include creating a toolpath instruction for depositing opaque onto a substrate, programming a precision dispense apparatus to execute the created toolpath instruction, and causing the precision … inc. murrayWeboptical photolithography (Patent Literature 2). However, this method has an advantage of an edge remaining on the fine channel formed by optical photolithography (so that the edge and corner of the fine channel does not sag). However, the photolithography produces a high-cost microchip. [0005] One of the conventional methods (Patent Liter- in but not inWebJun 25, 2002 · The present invention is a maskless photolithography system and method using a plasma display for creating two-dimensional and three-dimensional structures. Advantageously, the invention does not require masks, templates or stencils to create each of the planes or layers on a multi layer two-dimensional or three-dimensional structure. … inc. multifamilyWebJun 19, 2024 · A photolithography method is provided. The photolithography method includes forming a photoresist layer on a wafer, exposing a portion of the photoresist layer by using an exposure device and a mask, and forming a photoresist pattern by removing … in busy 意味WebDisclosed is an LCD panel photolithography process, employed in a lithography system for manufacturing a plurality of LCD panel, comprising steps of: performing photolithography to a glass substrate with a first mask, and the first mask comprises a plurality of sets of alignment marks corresponding to a plurality of following masks thereafter, and a plurality … inc. new lenoxWebAug 23, 2024 · U.S. Department of Energy Office of Scientific and Technical Information. Search DOE Patents. Search terms: Advanced search options in but not of hugh hewittWebPUBLICATIONS, PATENTS, & PRESENTATIONS: (h-index=34) • Two book chapters and over 100 articles in refereed journals (a list is attached) ... • Thin film patterning using photolithography . PATENTS: 1. Inventor, “Transparent omniphobic thin film articles”, U.S. Patent No. 10,844,479; Nov. 24, 2024 inc. lending club